Micrograph and structure of CrN films prepared by plasma immersion ion implantation and deposition using HPPMS plasma source

被引：18

作者：

Wu Zhongzhen ^{[1
]}

Tian Xiubo ^{[1
]}

Gong Chunzhi ^{[1
]}

Yang Shiqin ^{[1
]}

Chu, Paul K. ^{[2
]}

机构：

[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150006, Peoples R China

[2] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2013年 / 229卷

关键词：

Plasma Base ion implantation and deposition; High power pulsed magnetron sputtering; CrN; Micro-structure; Surface properties;

D O I：

10.1016/j.surfcoat.2012.04.012

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In order to achieve excellent adhesion between coatings and substrates, PBII&D technique was proposed and used more and more widely to produce hard coatings. Among the metal plasma source, one based on HPPMS technique (HPPMS-PIID) proposed recently seems to have great prospects. The present study aims to develop the difference of CrN films deposited on Si (100) and SU201 stainless steel substrates with PBII&D technique using different metal plasma sources of HPPMS, FCA and DCMS. In contrast to the other two samples, the sample based on HPPMS appears to have dense knitting-like surface and discontinuous columnar structure. The highest intensity of CrN(200) preferential orientation, best adhesion and hardness is obtained by HPPMS plasma source for the highly energetic ion implantation and bombardment, but the C fraction is a little higher since the sputtering of highly energetic ions. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：210 / 216

页数：7

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