Effect of evaporation on thin film deposition in dip coating process

被引：26

作者：

Kuznetsov, AV ^{[1
]}

Xiong, M ^{[1
]}

机构：

[1] N Carolina State Univ, Dept Mech & Aerosp Engn, Raleigh, NC 27695 USA

来源：

INTERNATIONAL COMMUNICATIONS IN HEAT AND MASS TRANSFER | 2002年 / 29卷 / 01期

关键词：

D O I：

10.1016/S0735-1933(01)00322-0

中图分类号：

O414.1 [热力学];

学科分类号：

摘要：

Evaporation from the free surface is an important phenomenon that occurs during dip coating process. Accounting for evaporation is crucial for correct prediction of film thickness during this process when evaporation rate is large. This paper suggests a method to extend the classical free meniscus theory to account for evaporation from the free surface in a two-component system. The governing equations are solved utilizing a finite difference method. The effects of evaporation on the free surface profile and solute concentration distribution are investigated. (C) 2002 Elsevier Science Ltd.

引用

页码：35 / 44

页数：10

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