Scatterometry evaluation of focus-dose effects of EUV structures

被引：1

作者：

Dasari, Prasad ^{[1
]}

Kritsun, Oleg ^{[2
]}

Li, Jie ^{[1
]}

Volkman, Catherine ^{[2
]}

Hu, Jiangtao ^{[1
]}

Liu, Zhuan ^{[1
]}

机构：

[1] Nanometrics Inc, 1550 Buckeye Dr, Milpitas, CA 95035 USA

[2] GLOBALFOUNDRIES, Sunnyvale, CA 94085 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVII | 2013年 / 8681卷

关键词：

Extreme Ultraviolet Lithography (EUVL); Focus Exposure Matrix (FEM); Double Patterning (DP); Critical Dimension Uniformity (CDU); Spectroscopic ellipsometry (SE); NISR; Rigorous Coupled Wave Analysis (RCWA); Critical Dimension Scanning Electron Microscopy (CD-SEM);

D O I：

10.1117/12.2012120

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

CD and shape control of extreme ultraviolet lithography (EUVL) structures is critical to ensure patterning performance at the 10 nm technology node and beyond. The optimum focus/dose control by EUV scanner is critical for CD uniformity, and the scanner depends on reliable and rapid metrology feedback to maintain control. The latest advances in scatterometry such as ellipsometry (SE), reflectometry (NISR), and Mueller matrix (MM) offers complete pattern profile, critical dimensions (CD), side-wall angles, and dimensional characterization. In this study, we will present the evaluation results of CD uniformity and focus dose sensitivity of line and space EUV structures at the limit of current ASML NXE 3100 scanner printability and complex 3D EUV structures. The results will include static and dynamic precision and CD-SEM correlation data.

引用

页数：15

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