Hardnes and resistivity of amorphous carbon thin films deposited by laser ablation

被引：1
|
作者：
Camps, Enrique [1 ,2 ]
Escobar-Alarcon, L. [1 ,2 ]
Castrejon-Sanchez, V. H. [1 ,2 ]
Tolentino-Eslava, P. [1 ,2 ,3 ]
机构：
[1] Inst Nacl Invest Nucl, Dept Fis, Mexico City 11801, DF, Mexico
[2] Univ Autonoma Estado Mexico, Fac Quim, Mexico City 50110, DF, Mexico
[3] Benemerita Univ Autonoma Puebla, Fac Ciencias, Puebla, Mexico
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2008年 / 93卷 / 03期
关键词：
D O I：
10.1007/s00339-008-4709-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Amorphous carbon thin films were deposited by laser ablation of a graphite target, using the fundamental line of a 5 ns Nd:YAG laser. Deposition was carried out as a function of the plasma parameters (mean kinetic ion energy and plasma density), determined by means of a planar probe. In the selected working regimes the optical emission from the plasma is mainly due to atomic species, namely C+ (426.5 nm); however, there is also emission from other atomic species and molecular carbon. The hardness and resistivity could be varied in the range between 10 and 25 GPa, and 10(8) and 10(11) Omega cm, respectively. The maximum values were obtained at a 200 eV ion energy and 6x10(13) cm(-3) plasma density, where the maximum quantity of C-C sp(3) bonds was formed, as confirmed by Raman spectroscopy.
引用
收藏
页码：759 / 763
页数：5
相关论文
共 50 条
  • [41] Optical and waveguiding properties of PLZT thin films deposited by laser ablation
    Jelínek, M
    Lancok, J
    Deineka, A
    Jastrabík, L
    Soukup, L
    Flory, F
    Escoubas, L
    FERROELECTRICS, 2001, 264 (1-4) : 1925 - 1930
  • [42] Vibrational spectroscopy of SiC thin films deposited by excimer laser ablation
    H. Hobert
    H.H. Dunken
    G. Peiter
    W. Stier
    M. Diegel
    H. Stafast
    Applied Physics A, 1999, 69 : 69 - 76
  • [43] Characterization of ZnO thin films deposited by laser ablation in reactive atmosphere
    Verardi, P
    Dinescu, M
    Andrei, A
    APPLIED SURFACE SCIENCE, 1996, 96-8 : 827 - 830
  • [44] Oxide thin films deposited by means of laser ablation - structure and properties
    Kusinski, Jan
    Kopia, Agnieszka
    Chmielowska, Magdalena
    Kac, Slawomir
    LASER TECHNOLOGY VIII: APPLICATIONS OF LASERS, 2007, 6598
  • [45] Studies of aluminum oxide thin films deposited by laser ablation technique
    Plociennik, P.
    Guichaoua, D.
    Korcala, A.
    Zawadzka, A.
    OPTICAL MATERIALS, 2016, 56 : 49 - 57
  • [46] Al-Sn thin films deposited by pulsed laser ablation
    Perrone, A
    Zocco, A
    de Rosa, H
    Zimmermann, R
    Bersani, M
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2002, 22 (02): : 465 - 468
  • [47] PBTIO3 THIN-FILMS DEPOSITED BY LASER ABLATION
    IMAI, T
    OKUYAMA, M
    HAMAKAWA, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (9B): : 2163 - 2166
  • [48] Investigations of ZnO thin films deposited by a reactive pulsed laser ablation
    J. B. Cui
    Y. C. Soo
    H. Kandel
    M. A. Thomas
    T. P. Chen
    C. P. Daghlian
    Science in China Series E: Technological Sciences, 2009, 52 : 99 - 103
  • [49] Characterization of MoO3 thin films deposited by laser ablation
    Campos-Gonzalez, E.
    Camps, Enrique
    Morales-Luna, M.
    Rivera-Rodriguez, C.
    Basurto, Rafael
    MATERIALS LETTERS, 2020, 277
  • [50] Vibrational spectroscopy of SiC thin films deposited by excimer laser ablation
    Hobert, H
    Dunken, HH
    Peiter, G
    Stier, W
    Diegel, M
    Stafast, H
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (01): : 69 - 76
12345