Microfabrication of millimeter wave vacuum electron devices by two-step deep-etch x-ray lithography

被引:69
|
作者
Shin, YM
So, JK
Han, ST
Jang, KH
Park, GS [1 ]
Kim, JH
Chang, SS
机构
[1] Seoul Natl Univ, Sch Phys, Seoul 151747, South Korea
[2] Seoul Natl Univ, NSI, NCRC, Seoul 151747, South Korea
[3] POSTECH, Pohang Accelerator Lab, Pohang 790784, South Korea
关键词
D O I
10.1063/1.2178770
中图分类号
O59 [应用物理学];
学科分类号
摘要
The circuits for millimeter wave vacuum electron devices with all circuit elements including an electron beam tunnel are microfabricated by two-step deep-etch x-ray lithography (x-ray LIGA). The discrepancies of eigenfrequency between experiment and simulation are within 1.1% in a coupled-cavity structure and 1.4% in a folded waveguide structure when the operating frequency is about 100 GHz. Furthermore, a measured tolerance of below 2 mu m, and a measured surface roughness of 20-70 nm, of LIGA-fabricated circuits implies the two-step LIGA microfabrication has potential applications up to the submillimeter wave region. (c) 2006 American Institute of Physics.
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页数:3
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