Electrodeposited Cu2O Microstructure as an Effective Ultraviolet (UV) Sensor Operating at Low Bias Voltages

被引：0

作者：

Zulkifli, Mohd Hafiz ^{[1
]}

Rani, Rozina Abdul ^{[2
]}

Saad, Nor Hayati ^{[2
]}

Makhsin, Siti Rabizah ^{[2
]}

Mamat, Mohamad Hafiz ^{[3
]}

Mahmood, Mohamad Rusop ^{[3
,4
]}

Zoolfakar, Ahmad Sabirin ^{[3
]}

机构：

[1] Univ Teknol MARA, Fac Elect Engn, Shah Alam, Selangor, Malaysia

[2] Univ Teknol MARA, Fac Mech Engn, Shah Alam, Selangor, Malaysia

[3] Univ Teknol MARA, Fac Elect Engn, NANO ElecTron Ctr, Shah Alam, Selangor, Malaysia

[4] Univ Teknol MARA, Fac Elect Engn, NANO SciTech Ctr, Inst Sci, Shah Alam, Selangor, Malaysia

来源：

PROCEEDINGS OF THE 2019 IEEE REGIONAL SYMPOSIUM ON MICRO AND NANOELECTRONICS (RSM) | 2019年

关键词：

cuprous oxide; electrodeposition; ultraviolet (UV) sensor; microcubic; negative bias; ELECTROCHEMICAL SYNTHESIS; THIN-FILMS; GROWTH;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Microstructure cuprous oxide (Cu2O) films were synthesized by an electrodeposition process with variation in duration of electrodeposition of 1000s, 3000s, 5000s, 7000s and 10000s. The electrodeposition process was carried out at -0.55V (vs Ag/AgCl). From emission scanning electron microscopy (FESEM), compact and denser of Cu2O microcubics was obtained as the durations of electrodeposition increase. Ultraviolet (UV) sensing performance was carried by using the UV lamp simulator and all samples were tested under UV illumination and dark condition for several cycles. The Cu2O layer with denser and higher thickness can be an advantage to perform fast response time and recovery time on Ultraviolet (UV) sensor. Negative bias tested on p-type metal oxide showed a better performance than positive bias tested on p-type metal oxide in the repeatability, sensitivity, resistance.

引用

页码：95 / 98

页数：4

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