Electrodeposited Cu2O Microstructure as an Effective Ultraviolet (UV) Sensor Operating at Low Bias Voltages

Microstructure cuprous oxide (Cu2O) films were synthesized by an electrodeposition process with variation in duration of electrodeposition of 1000s, 3000s, 5000s, 7000s and 10000s. The electrodeposition process was carried out at -0.55V (vs Ag/AgCl). From emission scanning electron microscopy (FESEM), compact and denser of Cu2O microcubics was obtained as the durations of electrodeposition increase. Ultraviolet (UV) sensing performance was carried by using the UV lamp simulator and all samples were tested under UV illumination and dark condition for several cycles. The Cu2O layer with denser and higher thickness can be an advantage to perform fast response time and recovery time on Ultraviolet (UV) sensor. Negative bias tested on p-type metal oxide showed a better performance than positive bias tested on p-type metal oxide in the repeatability, sensitivity, resistance.