Microstructure, magnetic and electronic transport properties of polycrystalline γ′-Fe4N films

被引:30
|
作者
Mi, W. B. [1 ]
Feng, X. P. [1 ]
Duan, X. F. [1 ]
Yang, H. [1 ]
Li, Y. [1 ]
Bai, H. L. [1 ]
机构
[1] Tianjin Univ, Inst Adv Mat Phys, Tianjin Key Lab Low Dimens Mat Phys & Preparing T, Fac Sci, Tianjin 300072, Peoples R China
基金
中国国家自然科学基金;
关键词
Iron nitride; Microstructure; Magnetic properties; Magnetoresistance; Sputtering; IRON NITRIDE FILMS; GROWTH;
D O I
10.1016/j.tsf.2012.07.053
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The single-phase gamma'-Fe4N films were fabricated using reactive sputtering. The x-ray diffraction peaks from gamma'-Fe4N(111), (200) and (311) indicate that the films are gamma'-Fe4N. The grain size increases with the increase of film thickness (t), and the grains grow with a columnar structure. All of the films are soft ferromagnetic at room temperature. The saturation magnetization decreases with the increasing temperature, and satisfies the modified Bloch's spin wave theory. The electrical transport properties show a metallic conductance mechanism, and the room-temperature resistivity decreases with the increasing t, revealing that the electron scattering increases with the decrease of t. The magnetoresistance (MR) evolves from positive to negative with the increase of temperature, and the transition temperature decreases with the increase of t. The positive MR at 5 K increases with the increasing t. The complex MR should be dominated by Lorentz force effect, the suppression of the electron scattering, and the shift of minority and majority spin bands under a magnetic field. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码:7035 / 7040
页数:6
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