Using high-quality, atomic point charges for metal-organic frameworks to enable high-throughput screening of materials for contaminant removal from methane

被引：0
|
作者：
Nazarian, Dalar [2 ]
Ganesh, Panchapakesan [3 ]
Camp, Jeffrey [2 ]
Sholl, David [1 ]
机构：
[1] Georgia Inst Tech, Atlanta, GA USA
[2] Georgia Inst Technol, Biomol & Chem Engn, Atlanta, GA 30332 USA
[3] Oak Ridge Natl Lab, CNMS, MS 6494, Oak Ridge, TN USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2016年 / 251卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
379
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页数：1
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