Contamination experiments for Mo/Si multilayer mirrors with the use of single-bunch synchrotron radiation

被引：1
|
作者：
Niibe, Masahito [1 ]
Koida, Keigo [1 ]
Kakutani, Yukinobu [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan
来源：
11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷
关键词：
LITHOGRAPHY PROJECTION OPTICS; SURFACE OXIDATION; EXTREME; PERFORMANCE;
D O I：
10.1088/1742-6596/425/13/132021
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
An extreme ultraviolet (EUV) irradiation experiment with the use of single-bunch synchrotron radiation (SR) was carried out to evaluate the optics lifetime for EUV lithography due to contaminations. The sequential change in the reflectivity of Ru-capped Mo/Si multilayer mirrors was measured during EUV irradiation in the presence of hydrocarbon gas or water vapor vacuum environment. The EUV dose dependence of decreases in reflectivity for single-bunch SR was almost the same as that for light-attenuated multibunch SR. From the results, there was no marked difference in the dependence of decrease in reflectivity on pulse structure in the frequency range of 2.5 to 500 MHz.
引用
收藏
页数：4
相关论文
共 50 条
  • [21] EUV damage threshold measurements of Mo/Si multilayer mirrors
    Mueller, Matthias
    Barkusky, Frank
    Feigl, Torsten
    Mann, Klaus
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2012, 108 (02): : 263 - 267
  • [22] Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet
    Slaughter, J.M.
    Schulze, Dean W.
    Hills, C.R.
    Mirone, A.
    Stalio, R.
    Watts, R.N.
    Tarrio, C.
    Lucatorto, T.B.
    Krumrey, M.
    Mueller, P.
    Falco, Charles M.
    Journal of Applied Physics, 1994, 76 (04): : 2144 - 2156
  • [23] EUV damage threshold measurements of Mo/Si multilayer mirrors
    Matthias Müller
    Frank Barkusky
    Torsten Feigl
    Klaus Mann
    Applied Physics A, 2012, 108 : 263 - 267
  • [24] TARNISHING OF MO/SI MULTILAYER X-RAY MIRRORS
    UNDERWOOD, JH
    GULLIKSON, EM
    NGUYEN, K
    APPLIED OPTICS, 1993, 32 (34): : 6985 - 6990
  • [25] Developments in realistic design for aperiodic Mo/Si multilayer mirrors
    Aquila, A. L.
    Salmassi, F.
    Dollar, F.
    Liu, Y.
    Gullikson, M.
    OPTICS EXPRESS, 2006, 14 (21): : 10073 - 10078
  • [26] Reflecting a single attosecond pulse by using periodic Mo/Si multilayer mirrors with different layers
    Lin Cheng-You
    Liu Da-He
    CHINESE PHYSICS B, 2012, 21 (09)
  • [27] Reflecting a single attosecond pulse by using periodic Mo/Si multilayer mirrors with different layers
    林承友
    刘大禾
    ChinesePhysicsB, 2012, 21 (09) : 338 - 344
  • [28] MULTILAYER-COATED MIRRORS AS POWER FILTERS IN SYNCHROTRON RADIATION BEAMLINES
    KORTRIGHT, JB
    PLAG, P
    PERERA, RCC
    COWAN, PL
    LINDLE, DW
    KARLIN, B
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1988, 266 (1-3): : 452 - 456
  • [29] Mo/Si multilayer mirrors with 300-bilayers for EUV lithography
    Ichimaru, Satoshi
    Hatayama, Masatoshi
    Ohchi, Tadayuki
    Oku, Satoshi
    PHOTOMASK JAPAN 2015: PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXII, 2015, 9658
  • [30] Influence of Beryllium Barrier Layers on the Properties of Mo/Si Multilayer Mirrors
    Zuev, S. Yu
    Pleshkov, R. S.
    Polkovnikov, V. N.
    Salashchenko, N. N.
    Svechnikov, M., V
    Chkhalo, N., I
    Schaefers, F.
    Sertsu, M. G.
    Sokolov, A.
    TECHNICAL PHYSICS, 2019, 64 (11) : 1688 - 1691
12345