Contamination experiments for Mo/Si multilayer mirrors with the use of single-bunch synchrotron radiation

被引：1

作者：

Niibe, Masahito ^{[1
]}

Koida, Keigo ^{[1
]}

Kakutani, Yukinobu ^{[1
]}

机构：

[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan

来源：

11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷

关键词：

LITHOGRAPHY PROJECTION OPTICS; SURFACE OXIDATION; EXTREME; PERFORMANCE;

D O I：

10.1088/1742-6596/425/13/132021

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An extreme ultraviolet (EUV) irradiation experiment with the use of single-bunch synchrotron radiation (SR) was carried out to evaluate the optics lifetime for EUV lithography due to contaminations. The sequential change in the reflectivity of Ru-capped Mo/Si multilayer mirrors was measured during EUV irradiation in the presence of hydrocarbon gas or water vapor vacuum environment. The EUV dose dependence of decreases in reflectivity for single-bunch SR was almost the same as that for light-attenuated multibunch SR. From the results, there was no marked difference in the dependence of decrease in reflectivity on pulse structure in the frequency range of 2.5 to 500 MHz.

引用

页数：4

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