Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays

被引:28
|
作者
Perez, Eduardo [1 ]
Ossorio, Oscar Gonzalez [2 ]
Duenas, Salvador [2 ]
Castan, Helena [2 ]
Garcia, Hector [2 ]
Wenger, Christian [1 ,3 ]
机构
[1] IHP Leibniz Inst Innovat Mikroelekt, D-15236 Frankfurt, Germany
[2] Univ Valladolid, Dept Elect, Valladolid 47011, Spain
[3] BTU Cottbus Senftenberg, D-01968 Cottbus, Germany
关键词
RRAM arrays; programming algorithm; pulse width; endurance; data retention; switching energy; ELECTRICAL CHARACTERIZATION; INTERFACE;
D O I
10.3390/electronics9050864
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
A crucial step in order to achieve fast and low-energy switching operations in resistive random access memory (RRAM) memories is the reduction of the programming pulse width. In this study, the incremental step pulse with verify algorithm (ISPVA) was implemented by using different pulse widths between 10 mu s and 50 ns and assessed on Al-doped HfO2 4 kbit RRAM memory arrays. The switching stability was assessed by means of an endurance test of 1k cycles. Both conductive levels and voltages needed for switching showed a remarkable good behavior along 1k reset/set cycles regardless the programming pulse width implemented. Nevertheless, the distributions of voltages as well as the amount of energy required to carry out the switching operations were definitely affected by the value of the pulse width. In addition, the data retention was evaluated after the endurance analysis by annealing the RRAM devices at 150 degrees C along 100 h. Just an almost negligible increase on the rate of degradation of about 1 mu A at the end of the 100 h of annealing was reported between those samples programmed by employing a pulse width of 10 mu s and those employing 50 ns. Finally, an endurance performance of 200k cycles without any degradation was achieved on 128 RRAM devices by using programming pulses of 100 ns width.
引用
收藏
页数:10
相关论文
共 47 条
  • [21] HfO2-based RRAM for Embedded Nonvolatile Memory: From Materials Science to Integrated 1T1R RRAM Arrays
    Bertaud, T.
    Walczyk, D.
    Sowinska, M.
    Wolansky, D.
    Tillack, B.
    Schoof, G.
    Stikanov, V.
    Wenger, Ch.
    Thiess, S.
    Schroeder, T.
    Walczyk, Ch.
    DIELECTRIC MATERIALS AND METALS FOR NANOELECTRONICS AND PHOTONICS 10, 2012, 50 (04): : 21 - 26
  • [22] Interface-engineered reliable HfO2-based RRAM for synaptic simulation (vol 7, pg 12682, 2019)
    Wang, Qiang
    Niu, Gang
    Roy, Sourav
    Wang, Yankun
    Zhang, Yijun
    Wu, Heping
    Zhai, Shijie
    Bai, Wei
    Shi, Peng
    Song, Sannian
    Song, Zhitang
    Xie, Ya-Hong
    Ye, Zuo-Guang
    Wenger, Christian
    Meng, Xiangjian
    Ren, Wei
    JOURNAL OF MATERIALS CHEMISTRY C, 2019, 7 (42) : 13307 - 13307
  • [23] Influence of the bottom metal electrode and gamma irradiation effects on the performance of HfO2-based RRAM devices
    Arun, N.
    Kumar, K. Vinod
    Mangababu, A.
    Rao, S. V. S. Nageswara
    Pathak, A. P.
    RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2019, 174 (1-2): : 66 - 75
  • [24] On the Origin of Low-Resistance State Retention Failure in HfO2-Based RRAM and Impact of Doping/Alloying
    Traore, Boubacar
    Blaise, Philippe
    Vianello, Elisa
    Grampeix, Helen
    Jeannot, Simon
    Perniola, Luca
    De Salvo, Barbara
    Nishi, Yoshio
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (12) : 4029 - 4036
  • [25] Low-frequency noise performance of HfO2-based gate stacks
    Claeys, C
    Simoen, E
    Mercha, A
    Pantisano, L
    Young, E
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (09) : F115 - F123
  • [26] Superior and ultrafast energy storage performance of relaxorantiferroelectric HfO2-based supercapacitors
    Shuai, Wentao
    Dai, Ji-Yan
    Xu, Zihao
    Tian, Guo
    Luo, Chunlai
    Li, Ming
    Tao, Ruiqiang
    Fan, Zhen
    Chen, Deyang
    Zhou, Guofu
    Lu, Xubing
    Liu, Junming
    ENERGY STORAGE MATERIALS, 2023, 62
  • [27] Understanding of the Endurance Failure in Scaled HfO2-based 1T1R RRAM through Vacancy Mobility Degradation
    Chen, Yang Yin
    Degraeve, Robin
    Clima, Sergiu
    Govoreanu, Bogdan
    Goux, Ludovic
    Fantini, Andrea
    2012 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2012,
  • [28] Improved Resistive Switching Characteristics by Al2O3 Layers Inclusion in HfO2-Based RRAM Devices
    Huang, Chun-Yang
    Jieng, Jheng-Hong
    Jang, Wen-Yueh
    Lin, Chen-Hsi
    Tseng, Tseung-Yuen
    ECS SOLID STATE LETTERS, 2013, 2 (08) : P63 - P65
  • [29] Performance Improvement via Stack Engineering and Post-bake Retention State Stabilization in Fully CMOS Compatible HfO2-based RRAM
    Samanta, Subhranu
    Chen Zhixian
    Lee, Hock Koon
    Weijie Wang
    Song Wendong
    Yao Zhu
    Li Chen
    Chen Liu
    2023 IEEE INTERNATIONAL SYMPOSIUM ON APPLICATIONS OF FERROELECTRICS, ISAF, 2023,
  • [30] A low-power nanoelectromechanical (NEM) device with Al-doped HfO2-based ferroelectric capacitor
    Kim, Shinhee
    Park, Jae Yeon
    Go, Seungwon
    Kwon, Hyug Su
    Choi, Woo Young
    Kim, Sangwan
    SOLID-STATE ELECTRONICS, 2021, 175