Photon stimulated ion desorption from condensed chloroform on Si(100) at the Cl and SiK-edges

被引:2
|
作者
Rocco, MLM
Mota, GV
Pinho, RR
机构
[1] Univ Fed Rio de Janeiro, Inst Quim, BR-21949900 Rio De Janeiro, RJ, Brazil
[2] Univ Fed Juiz Fora, Dept Fis ICE, BR-36036330 Juiz De Fora, MG, Brazil
关键词
photon stimulated ion desorption (PSID); condensed chloroform; synchrotron radiation; site-specific desorption; Auger stimulated ion desorption (ASID); X-ray induced electron stimulated desorption (XESD);
D O I
10.1016/j.elspec.2005.11.008
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Photon stimulated ion desorption (PSID) studies have been performed in chloroform condensed on Si(100) at similar to 85 K using synchrotron radiation at the chlorine and silicon 1s-edges. Data acquisition was performed at the Brazilian synchrotron light source (LNLS), during a single-bunch operation mode of the storage ring. It was found that hydrogen ion is the main ionic species to desorb after photon excitation followed by other fragments with lower intensities. Desorption ion yields for H+ and Cl+ were obtained as a function of the photon energy. A pronounced enhancement of the Cl+ yield was observed at the first Cl Is resonance, which may be related to a spectator Auger process. In order to verify the influence of the substrate in the ionic desorption of condensed chloroform, PSID spectra were also measured at the silicon Is-edge. The indirect X-ray induced electron stimulated desorption (XESD) mechanism seems to dominate. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:135 / 139
页数:5
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