Photocatalytic Activity of Metal-Inserted WO3 Thin Films Prepared by RF Magnetron Sputtering

被引：11
|
作者：
Kim, Soon Wook [1 ]
Kim, Hong-Ki [1 ]
Choi, Hyun Wook [1 ]
Yoo, Dae-Hwang [1 ]
Kim, Eui Jung [2 ]
Hahn, Sung Hong [1 ]
机构：
[1] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[2] Univ Ulsan, Dept Chem Engn, Ulsan 680749, South Korea
来源：
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2013年 / 13卷 / 10期
关键词：
RF Magnetron Sputtering; Tungsten Oxide Thin Film; Photocatalytic Activity;
D O I：
10.1166/jnn.2013.7733
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Metal (Au,Pt)-inserted WO3 thin films were deposited on quartz glass using a radio frequency magnetron sputtering method. Their structural and optical properties were analyzed by scanning electron microscopy, X-ray diffractometry, absorption spectrometry, and photoluminescence spectrometry. The photocatalytic activities of the films were investigated by the measurement of photodecomposition of methylene blue under visible-ray irradiation. Metal-inserted WO3 films showed higher photocatalytic activity than WO3 film. Pt-inserted WO3 thin film showed the most effective decomposition efficiency, it is due to the high absorption and the suppression of recombination between photo-excited electrons and holes.
引用
收藏
页码：7053 / 7055
页数：3
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