Realistic surface reaction modeling for 3D feature profile simulation of fluorocarbon-based plasma etch process

被引：0
|
作者：
Yook, Yeong-Geun [1 ]
You, Hae Sung [1 ]
Im, Yeon Ho [1 ]
Chang, Won-Seok [2 ]
机构：
[1] Chonbuk Natl Univ, Sch Semicond & Chem Engn, Jeonju Si 54896, Jeonbuk, South Korea
[2] Natl Fus Res Inst, Plasma Technol Res Ctr, Gunsan Si 573540, Jeonbuk, South Korea
来源：
2016 43RD IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS) | 2016年
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D O I：
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中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页数：1
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