Temperature-dependent power-law analysis of capacitance-voltage for GaN-based pn junction

被引:6
|
作者
Wang, Chun An [1 ,2 ]
Fu, Silie [3 ]
Liu, Liu [1 ]
Li, Junxian [3 ]
Bao, Jiayi [3 ]
机构
[1] South China Normal Univ, South China Acad Adv Optoelect, Guangzhou 510006, Guangdong, Peoples R China
[2] Guangdong Polytech Normal Univ, Sch Elect & Informat, Guangzhou 510665, Guangdong, Peoples R China
[3] South China Normal Univ, Guangdong Prov Key Lab Quantum Engn & Quantum Mat, Sch Phys & Telecommun Engn, Guangzhou 510006, Guangdong, Peoples R China
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.5020922
中图分类号
O59 [应用物理学];
学科分类号
摘要
Capacitance-voltage (C-V) measurement is an effective method that has been widely used to study the electronic characteristics of the pn junction. In this paper, the C-V measurement is used to study the effect of the temperature on the structural type of the GaN-based pn junction. The C-2-V and C-3-V curves, combined with power-law index k, are used to determine the structural type of the GaN-based pn junction when the temperature is set at 25 degrees C, 50 degrees C, 100 degrees C, 150 degrees C, and 195 degrees C. Our experimental results show that the C-2-V curve is a clear linear relation, and the index k is 0.5 when the temperature is set at 25 degrees C and 50 degrees C. This shows an abrupt junction when the temperature ranges from 25 degrees C to 50 degrees C. When the temperature is dropped to 100 degrees C, the structural type of the pn junction begins to change and the index k becomes 0.45. When the temperature is decreased further to T = 150 degrees C and 195 degrees C, the index k becomes 0.30 and 0.28, respectively, corresponding to a non-abrupt and non-linear junction. Possible explanations of this phenomenon are: the low-temperature carrier freeze-out effect and the localized space charge region that is produced by crystal defects and interface states. The enhancement of the inhomogeneous and localized space charge region further affects the structural type of the pn junction in a low temperature environment. Published by AIP Publishing.
引用
收藏
页数:6
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