Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012)

被引：0
|
作者：
Ponomarev, M. V. [1 ]
Verheijen, M. A. [1 ]
Keuning, W. [1 ]
van de Sanden, M. C. M. [1 ,2 ]
Creatore, M. [1 ,3 ]
机构：
[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands
[2] Dutch Inst Fundamental Energy Res DIFFER, NL-3430 BE Nieuwegein, Netherlands
[3] Solliance, NL-5656 AE Eindhoven, Netherlands
来源：
JOURNAL OF APPLIED PHYSICS | 2012年 / 112卷 / 06期
关键词：
D O I：
10.1063/1.4754316
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页数：1
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