Production of ion and electron streams by pulsed-laser ablation of Ta and Cu

A Nd:YAG laser with 10(9) W/cm(2) pulse intensity, operating at 532 nm wavelength, is used to ablate Ta and Cu targets placed in vacuum. The ablation process generates a plasma in front of the target surface, which expands along the normal to target surface. The ion and electron emissions from the plasma were measured by Faraday cups placed at different angles with respect to the normal to target surface. In the range of laser intensities from 10(7) to 10(9) W/cm(2) , the fast electron yield is lower than the ion yield and it increases at higher laser intensities. The ablation threshold, the emission yield, the ion and electron average energies and the plasma ion and electron temperatures were measured for ion and fast electron streams.