Low temperature magnetization and resistivity measurements in Co based soft magnetic microwires

被引：7
|
作者：
Llumá, J
Vázquez, M
Hernandez, JM
Ruiz, JM
García-Beneytez, JM
Zhukov, A
Castaño, FJ
Zhang, XX
Tejada, J
机构：
[1] Inst Magnetismo Aplicado, E-28230 Madrid, Spain
[2] Inst Ciencia Mat, E-28230 Madrid, Spain
[3] Univ Barcelona, Dept Fis Fonamental, E-08028 Barcelona, Spain
来源：
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 1999年 / 196卷
关键词：
amorphous materials; magnetization process; resistivity; magnetoresistance;
D O I：
10.1016/S0304-8853(98)00953-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Magnetization and resistivity measurements, embracing a temperature range 2-300 K, have been performed in glass-coated Co68Mn7Si10B15 amorphous microwires. The relation between both types of measurements is analysed. Similar trends of the temperature dependence of the domain structure, magnetization and resistivity are observed. An increase of resistance is found for the saturated state. This increase of the resistivity is analysed in terms of the domain structure and the presence of domain walls. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：821 / 823
页数：3
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