Electron-hole transport asymmetry in Boron-doped Graphene Field Effect Transistors

被引:8
|
作者
Marconcini, P. [1 ]
Cresti, A. [2 ]
Triozon, F. [3 ]
Fiori, G. [1 ]
Biel, B. [4 ]
Niquet, Y. -M. [5 ]
Macucci, M. [1 ]
Roche, S. [6 ]
机构
[1] Univ Pisa, Dipartimento Ingn Informaz, Via Caruso 16, I-56122 Pisa, Italy
[2] Univ Savoie, CNRS, Grenoble INP UJF, IMP LAHC,UMR 5130, F-38016 Grenoble, France
[3] CEA Grenoble, LETI MINATEC, F-38054 Grenoble, France
[4] Univ Granada, Fac Ciencias, CITIC, Dept Elect & Tecnol Comp, E-18071 Granada, Spain
[5] CEA Grenoble, INAC SP2M, F-38054 Grenoble, France
[6] Univ Autonoma Barcelona, Catalan Inst Nanotechnol, CSIC, CIN2 ICN, Bellaterra 08193, Spain
关键词
CARBON NANOTUBES; NANORIBBONS; GAPS;
D O I
10.1109/IWCE.2012.6242844
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
One of the main drawbacks of undoped graphene for digital electronics applications is its ambipolar behavior. Here we study the trasfer characteristics of transistors based on boron-doped graphene nanoribbons with atomic concentrations up to 0.6%, showing that the presence of doping generates a clear electron-hole transport asymmetry. In order to obtain these results, we introduce a method to accurately reproduce density functional theory (DFT) results using a self-consistent tight-binding (TB) model with a proper distribution of fixed charges.
引用
收藏
页数:4
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