Focused ion beam milling of exfoliated graphene for prototyping of electronic devices

被引：11
|
作者：
Schmidt, Marek E. [1 ]
Johari, Zaharah [1 ,2 ]
Ismail, Razali [2 ]
Mizuta, Hiroshi [1 ]
Chong, Harold M. H. [1 ]
机构：
[1] Univ Southampton, Sch Elect & Comp Sci, Nano Res Grp, Southampton SO17 1BJ, Hants, England
[2] Univ Teknol Malaysia, Dept Elect Engn, Johor Baharu 81310, Johor, Malaysia
来源：
MICROELECTRONIC ENGINEERING | 2012年 / 98卷
关键词：
Focused ion beam; FIB assisted deposition; Graphene; FIB milling; Prototyping; DEPOSITION;
D O I：
10.1016/j.mee.2012.07.090
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We demonstrate a focused ion beam (FIB) prototyping technique that accurately aligns a two terminal contact structure to exfoliated graphene. Alignment accuracy of better than 250 nm has been achieved without direct FIB imaging of the graphene. In situ deposited tungsten is used to contact the graphene channel and the measured channel resistance is 58 k Omega. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码：313 / 316
页数：4
相关论文
共 50 条
  • [31] Austenite Stability Under Focused Ion Beam Milling
    Li, Jian
    Liu, Pei
    CHARACTERIZATION OF MINERALS, METALS, AND MATERIALS 2020, 2020, : 81 - 88
  • [32] Advanced scanning paths for focused ion beam milling
    Yoon, Hae-Sung
    Kim, Chung-Soo
    Lee, Hyun-Taek
    Ahn, Sung-Hoon
    VACUUM, 2017, 143 : 40 - 49
  • [33] Focused ion beam milling of microchannels in lithium niobate
    Sridhar, Manoj
    Maurya, Devendra K.
    Friend, James R.
    Yeo, Leslie Y.
    BIOMICROFLUIDICS, 2012, 6 (01):
  • [34] Effect of focused ion beam milling on microcantilever loss
    Anthony, C. J.
    Torricelli, G.
    Prewett, P. D.
    Cheneler, D.
    Binns, C.
    Sabouri, A.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2011, 21 (04)
  • [35] Maskless milling of diamond by a focused oxygen ion beam
    Aiden A. Martin
    Steven Randolph
    Aurelien Botman
    Milos Toth
    Igor Aharonovich
    Scientific Reports, 5
  • [36] Focused ion beam system for automated MEMS prototyping and processing
    Athas, GJ
    Noll, KE
    Mello, R
    Hill, R
    Yansen, D
    Wenners, FF
    Nadeau, JP
    Ngo, T
    Siebers, M
    MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY III, 1997, 3223 : 198 - 207
  • [37] Successful Prototyping of Complex Integrated Circuits with Focused Ion Beam
    Petitprez, E.
    Colombo, D. M.
    Henes, F. M.
    Courcelle, L.
    Tararam, R.
    Jacobsen, S.
    Soares, R.
    Krug, C.
    Lubaszewski, M.
    2016 29TH SYMPOSIUM ON INTEGRATED CIRCUITS AND SYSTEMS DESIGN (SBCCI), 2016,
  • [38] Focused ion beam technology for optoelectronic devices
    Reithmaier, JP
    Bach, L
    Forchel, A
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, 680 : 584 - 587
  • [39] Direct milling of 25 nm in diameter gold and graphene nanogears by a focused He+ ion beam
    Sakurai, Makoto
    Nagano, Shoko
    Joachim, Christian
    VACUUM, 2023, 207
  • [40] Rapid prototyping of magnetic tunnel junctions with focused ion beam processes
    Persson, Anders
    Thornell, Greger
    Nguyen, Hugo
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2010, 20 (05)
12345