This paper details an extraction procedure to fully model the transient self-heating of transistors from a GaN HEMT technology. Frequency-resolved gate resistance thermometry (f-GRT) is used to extract the thermal impedance of HEMTs with various gate widths. A fully scalable analytical model is developed from the experimental results. In the second stage, transient thermoreflectance imaging (TTI) is used to bring deeper insights into the HEMTs' temperature distribution by individually extracting the transient self-heating of each finger. TTI results are further used to successfully validate the f-GRT results and the modeling of the thermal impedance. Overall, f-GRT is demonstrated to be a fast and robust method for characterizing the transient thermal characteristics of a GaN HEMT. For the first time to the authors' knowledge, a scalable model of the thermal impedance is extracted fully from experimental results.
机构:
Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
Pavlov A.Y.
Pavlov V.Y.
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Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
Pavlov V.Y.
Slapovskiy D.N.
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Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
Slapovskiy D.N.
Arutyunyan S.S.
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Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
Arutyunyan S.S.
Fedorov Y.V.
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Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
Fedorov Y.V.
Mal’tsev P.P.
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Institute of Microwave Semiconductor Electronics, Russian Academy of Sciences, MoscowInstitute of Microwave Semiconductor Electronics, Russian Academy of Sciences, Moscow
机构:
Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Univ Chinese Acad Sci, Beijing 100049, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Zhang, Guobin
Zhao, Miao
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Zhao, Miao
Yan, Chunli
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Umea Univ, Dept Comp Sci, S-90187 Umea, SwedenChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Yan, Chunli
Sun, Bing
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Sun, Bing
Wu, Zonggang
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Wu, Zonggang
Chang, Hudong
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Chang, Hudong
Jin, Zhi
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Jin, Zhi
Sun, Jie
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Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, SwedenChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China
Sun, Jie
Liu, Honggang
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Chinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R ChinaChinese Acad Sci, Inst Microelect, Beitucheng West Rd, Beijing 100029, Peoples R China