Momentum-resolved photoelectron interference in crystal surface barrier scattering

被引：9
|
作者：
Winkelmann, Aimo [1 ]
Ellguth, Martin [1 ]
Tusche, Christian [1 ]
Uenal, A. Akin [1 ]
Henk, Juergen [2 ]
Kirschner, Juergen [1 ]
机构：
[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany
[2] Univ Halle Wittenberg, Inst Phys, FG Theoret Phys, D-06120 Halle, Germany
来源：
PHYSICAL REVIEW B | 2012年 / 86卷 / 08期
关键词：
ENERGY-ELECTRON-DIFFRACTION; POTENTIAL BARRIER; METAL-SURFACES; FINE-STRUCTURE; STATES; SPECTROSCOPY; CU(001); PHOTOEMISSION; W(001); LEED;
D O I：
10.1103/PhysRevB.86.085427
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The quantum-mechanical transmission process of a photoelectron through a surface leaves distinctive marks in the electron momentum distribution emitted from a crystal. By energy-resolved measurements of the complete photoemission half-space above a Cu(001) surface using a momentum microscope, we identify the two-path interference of directly emitted photoelectrons and electrons, which have been scattered through the surface quantum well via a diffraction process. The basic principle of photoelectron surface barrier interference is revealed by an analytical model. A quantitative comparison to the experiment is obtained by one-step photoemission calculations for different surface barrier models.
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页数：5
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