Momentum-resolved photoelectron interference in crystal surface barrier scattering

被引：9

作者：

Winkelmann, Aimo ^{[1
]}

Ellguth, Martin ^{[1
]}

Tusche, Christian ^{[1
]}

Uenal, A. Akin ^{[1
]}

Henk, Juergen ^{[2
]}

Kirschner, Juergen ^{[1
]}

机构：

[1] Max Planck Inst Mikrostrukturphys, D-06120 Halle, Germany

[2] Univ Halle Wittenberg, Inst Phys, FG Theoret Phys, D-06120 Halle, Germany

来源：

PHYSICAL REVIEW B | 2012年 / 86卷 / 08期

关键词：

ENERGY-ELECTRON-DIFFRACTION; POTENTIAL BARRIER; METAL-SURFACES; FINE-STRUCTURE; STATES; SPECTROSCOPY; CU(001); PHOTOEMISSION; W(001); LEED;

D O I：

10.1103/PhysRevB.86.085427

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The quantum-mechanical transmission process of a photoelectron through a surface leaves distinctive marks in the electron momentum distribution emitted from a crystal. By energy-resolved measurements of the complete photoemission half-space above a Cu(001) surface using a momentum microscope, we identify the two-path interference of directly emitted photoelectrons and electrons, which have been scattered through the surface quantum well via a diffraction process. The basic principle of photoelectron surface barrier interference is revealed by an analytical model. A quantitative comparison to the experiment is obtained by one-step photoemission calculations for different surface barrier models.

引用

页数：5

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