901 nm Lithographic vertical-cavity surface-emitting laser with stable single-lobed beam pattern

被引：0

作者：

Li, M. ^{[1
]}

Yang, X. ^{[1
]}

Zhang, Y. ^{[1
]}

Zhao, G. ^{[2
]}

Beadsworth, J. ^{[2
]}

Eifert, L. ^{[3
]}

Tucker, F. ^{[3
]}

Deppe, D. G. ^{[1
,2
]}

机构：

[1] Univ Cent Florida, Coll Opt & Photon, CREOL, Orlando, FL 32816 USA

[2] SdPhoton LLC, Orlando, FL 32816 USA

[3] Army Res Lab, Orlando, FL 32826 USA

来源：

ELECTRONICS LETTERS | 2015年 / 51卷 / 21期

关键词：

Efficiency; -; Transceivers;

D O I：

10.1049/el.2015.3003

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Data are presented on 901 nm lithographic vertical-cavity surface-emitting lasers (VCSELs) demonstrating high efficiency for small VCSEL sizes, and stable beam patterns. Power conversion efficiency >40% is obtained for VCSELs ranging in size from 6 to 2 mu m diameter. The 2 mu m diameter VCSELs produce output powers in excess of 6.5 mW, and produce single-lobed far-field radiation patterns over the full range of operation.

引用

页码：1683 / U104

页数：2

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