Design and analysis of phase gratings for laser beams coherent combination

被引：6

作者：

Luo, Boliang

Wang, Chengcheng

Du, Jinglei ^{[1
]}

Ma, Chi

Guo, Yongkang

Yao, Jun

机构：

[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China

[2] Natl Key Lab Laser Fus, Mianyang 621900, Peoples R China

[3] Univ Durham, Dept Phys, CfAI, Durham TS21 3FB, England

来源：

MICROELECTRONIC ENGINEERING | 2006年 / 83卷 / 4-9期

基金：

中国国家自然科学基金;

关键词：

beam combination; phase grating; fabrication aberration; MEMS-based gray-tone lithography; DMD;

D O I：

10.1016/j.mee.2006.01.123

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The aperture-coded or multilevel phase grating can obtain higher diffraction efficiency for laser beam shaping than general binary phase grating (BPG). In this paper, a multiple phase grating (MPG) for coherent addition of 5 x 5 laser beams is designed. The grating can be fabricated by the gray-tone photolithography technology, which employs the computer controlled spatial-light-modulator (SLM) as a mask. This fabrication method is simple, cheap and some aberrations in photolithography process can be reduced in one-step exposure. We have simulated the exposure dose of the gray-tone photolithography for fabricating the multilevel phase grating, and the effects of fabrication error were analysed. The simulation results showed that the coupling efficiency of MPG for laser beams was 78.74%. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：1368 / 1371

页数：4

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