Advanced photoresist dispense valve control technology

被引:0
|
作者
Standley, Garrett [1 ]
Kidd, Brian [2 ]
Hartman, Kevin [2 ]
机构
[1] Freescale Semicond, Austin, TX 78742 USA
[2] Integrated Design Inc, Austin 75007, TX USA
关键词
resist minimization; photolithography; filter; wafer coating defects; pump; digital dispense valve;
D O I
10.1117/12.656628
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Resist minimization techniques have been around since the mid-1990s. As the volume decreases, the accuracy of the systems must increase. These inaccuracies can negate any savings that could potentially be acquired due to rework or even scrap. This has become a problem for older factories with pumps that are not accurate below 2.0ml. In order to help with these issues, Integrated Designs has created the digital dispense valve. This mechanical addition can prolong the life of a pump and saving the costly pump replacement scenario. The digital dispense valve increases the accuracy at lower dispense volumes and give more repeatable suckback control than was previously available for this generation of pump systems.
引用
收藏
页码:U1722 / U1732
页数:11
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