Synthesis of crystalline carbon nitride films at low temperature

被引:0
|
作者
Ma, ZB [1 ]
Wang, JH [1 ]
Wan, J [1 ]
Huang, YF [1 ]
机构
[1] Key Lab Plasma Chem & Adv Mat, Sch Mat Sci & Technol, Wuhan 430073, Peoples R China
关键词
pulsed arc discharge; carbon nitride; methanol;
D O I
暂无
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 degreesC). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 degreesC) would decrease the content of nitrogen in the films and result in a formation of carbon films.
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页码:349 / 352
页数:4
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