Synthesis of crystalline carbon nitride films at low temperature

被引：0

作者：

Ma, ZB ^{[1
]}

Wang, JH ^{[1
]}

Wan, J ^{[1
]}

Huang, YF ^{[1
]}

机构：

[1] Key Lab Plasma Chem & Adv Mat, Sch Mat Sci & Technol, Wuhan 430073, Peoples R China

来源：

CHINESE JOURNAL OF INORGANIC CHEMISTRY | 2004年 / 20卷 / 03期

关键词：

pulsed arc discharge; carbon nitride; methanol;

D O I：

暂无

中图分类号：

O61 [无机化学];

学科分类号：

070301 ; 081704 ;

摘要：

The synthesis of carbon nitride films at low temperature has been investigated using pulsed arc discharge from methanol solution with nitrogen atmosphere. Raman spectra and X-ray diffraction (XRD) analysis suggest that crystalline carbon nitride films may be prepared at low substrate temperature (220 degreesC). At same time, the substrate temperature has a significantly effect on the nitrogen content and structure of the films. Increasing substrate temperature (300 degreesC) would decrease the content of nitrogen in the films and result in a formation of carbon films.

引用

页码：349 / 352

页数：4

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