Ag (100)/MgO(100) interface: A van der Waals density functional study

被引:7
|
作者
He, Bingling [1 ]
Ma, Dongwei [2 ]
Hao, Wei [1 ]
Xiao, Wei [3 ]
Tian, Zhixue [4 ,5 ,6 ]
机构
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Beijing 100083, Peoples R China
[2] Anyang Normal Univ, Sch Phys, Anyang 455000, South Korea
[3] Gen Res Inst Nonferrous Met, State Key Lab Nonferrous Met & Proc, Beijing 100088, Peoples R China
[4] Osaka Univ, Grad Sch Engn, Suita, Osaka 5650871, Japan
[5] Hebei Normal Univ, Dept Phys, Shijiazhuang 050024, Hebei, Peoples R China
[6] Hebei Normal Univ, Hebei Adv Thin Film Lab, Shijiazhuang 050024, Hebei, Peoples R China
关键词
Ag (100)/MgO(100) interface; Non local vdW-DF functional; Adhesion energy; Interfacial distance; AG/MGO(001) INTERFACE; HARTREE-FOCK; THIN-FILMS; ADSORPTION; ADHESION; SURFACES; MGO; MORPHOLOGY; ROUGHNESS; ENERGY;
D O I
10.1016/j.apsusc.2013.09.158
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In the present work, we have investigated the interface of Ag (100) thin films epitaxially grown on the MgO (100) substrate by using three distinct functionals: the conventional GGA and LDA functionals, and the recently developed non-local vdW-DF functional. The vdW-DF functional can successfully repeat both the structural and energetically details of the interface in the experiments. As expected, the GGA significantly underestimates the interfacial cohesion. Although the adhesion energies obtained by the LDA functional are close to those by vdW-DF, LDA cannot describe the long-range interaction of the interface accurately as vdW-DF does when the Ag thin films are away from the MgO substrate. We propose that the vdW correction should be taken into account for studying the physical and chemical properties of the metal-ceramic interfaces bound by the weak interaction. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:115 / 121
页数:7
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