Polarization-independent high-index contrast grating and its fabrication tolerances

被引:30
|
作者
Ikeda, Kazuhiro [1 ]
Takeuchi, Kazuma [1 ]
Takayose, Kentaro [1 ]
Chung, Il-Sug [2 ]
Mork, Jesper [2 ]
Kawaguchi, Hitoshi [1 ]
机构
[1] Nara Inst Sci & Technol, Grad Sch Mat Sci, Nara 6300192, Japan
[2] Tech Univ Denmark, Dept Photon Engn, DK-2800 Lyngby, Denmark
关键词
18;
D O I
10.1364/AO.52.001049
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A polarization-independent, high-index contrast grating (HCG) with a single layer of cross stripes allowing simple fabrication is proposed. Since the cross stripes structure can be suspended in air by selectively wet-etching the layer below, all the layers can be grown at once when implemented for vertical-cavity surface-emitting lasers. We optimized the structure to have a broad and high reflectivity band centered at around 1 mu m using a finite difference time domain method, and obtained an 80 nm high reflectivity band centered at 0.97 mu m in which the reflectivity exceeded 99.5%. We also investigated the fabrication tolerances of the structure and found that, assuming careful optimizations of electron beam lithography for the precise grating width and dry-etching for the vertical sidewall, the suggested polarization-independent HCG can be fabricated using standard technologies. (C) 2013 Optical Society of America
引用
收藏
页码:1049 / 1053
页数:5
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