Surface characterization of Mo oxynitride films obtained by RF sputtering at various N2 ratios

Molybdenum oxynitride (MoNxOy) thin films were deposited on p-type Si(100) wafer by rf magnetron sputtering method at various nitrogen gas ratios. The surface characteristics of deposited thin films were investigated using scanning electron microscopy, atomic force microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. The thickness of films decreased down to 70 from 1000 nm and the roughness was varied with increasing N-2 gas ratio. The formation of MoNxOy was confirmed by existence of Mo species between Mo delta+ and Mo5+ oxidation state and ON bond in XP spectra. At 0% of N-2 gas ratio, metallic simple cubic Mo structure was observed. As the N-2 gas ratio increased, Mo nitrate and Mo silicate phases were appeared.