Cell Adhesion on Cathodic Arc Plasma Deposited ZrAlSiN Thin Films

被引:1
|
作者
Kim, Sun Kyu [1 ]
Vuong Hung Pham [2 ]
机构
[1] Univ Ulsan, Sch Mat Sci & Engn, Ulsan 680749, South Korea
[2] Hanoi Univ Sci & Technol, Adv Inst Sci & Technol, Hanoi, Vietnam
来源
关键词
biomaterials; deposition; surface; image analysis; ZrAlSiN; IMPROVED CORROSION-RESISTANCE; IN-VITRO; ZIRCONIUM; TIN; BIOCOMPATIBILITY; MICROSTRUCTURE; COATINGS; TITANIUM; ALLOY; ZRN;
D O I
10.3365/KJMM.2013.51.12.907
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Interaction between ZrAlSiN thin films and osteoblasts cells was conducted in vitro. Ti and ZrAlSiN films were deposited on glass coverslips by cathodic arc deposition. Ti, ZrAlSiN thin films and the bare glass coverslips were cultured with human osteoblast cells (hFOB). Cell morphology was observed with a confocal microscope in the bright field mode. Cell viability was assayed by MTT. Cell proliferation was fluorescent visualized at 10 X magnification. Cell cytoskeletons were analyzed by observing actin stress fiber organization. Focal contact adhesion was studied by investigation of the density of the vinculin. Cell viability, cell proliferation, developed actin stress fibers and focal contact adhesion were found better on ZrAlSiN thin films than on Ti thin films or glass surfaces.
引用
收藏
页码:907 / 912
页数:6
相关论文
共 50 条
  • [21] Structural and Mechanical Properties of Nanostructured TiAlCrN Thin Films Deposited by Cathodic Arc Deposition
    Vattanaprateep, N.
    Panich, N.
    Surinphong, S.
    Tungasmita, S.
    Wangyao, P.
    HIGH TEMPERATURE MATERIALS AND PROCESSES, 2013, 32 (02) : 107 - 111
  • [22] Effect of Ion Energy on Structure and Composition of Cathodic Arc Deposited Alumina Thin Films
    Johanna Rosén
    Stanislav Mráz
    Ulrich Kreissig
    Denis Music
    Jochen M. Schneider
    Plasma Chemistry and Plasma Processing, 2005, 25 : 303 - 317
  • [23] Effect of ion energy on structure and composition of cathodic arc deposited alumina thin films
    Rosén, J
    Mráz, S
    Kreissig, U
    Music, D
    Schneider, J
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2005, 25 (04) : 303 - 317
  • [24] Preparation and characterization of copper oxide thin films deposited by filtered cathodic vacuum arc
    Gan, ZH
    Yu, GQ
    Tay, BK
    Tan, CM
    Zhao, ZW
    Fu, YQ
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (01) : 81 - 85
  • [25] Deposition rate and thickness uniformity of thin films deposited by a pulsed cathodic arc process
    Fuchs, H
    Engers, B
    Hettkamp, E
    Mecke, H
    Schultz, J
    SURFACE & COATINGS TECHNOLOGY, 2001, 142 : 655 - 660
  • [26] Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system
    Hsieh, WJ
    Lin, CC
    Chen, US
    Chang, YS
    Shih, HC
    DIAMOND AND RELATED MATERIALS, 2005, 14 (01) : 93 - 97
  • [27] Effect of deposition parameters on texture of TiN films deposited by filtered cathodic arc plasma
    Zhang, Yu-Juan
    Wu, Zhi-Guo
    Zhang, Wei-Wei
    Li, Xin
    Yan, Peng-Xun
    Liu, Wei-Min
    Xue, Qun-Ji
    Zhongguo Youse Jinshu Xuebao/Chinese Journal of Nonferrous Metals, 2004, 14 (08):
  • [28] Control of stress and microstructure in cathodic arc deposited films
    Bilek, MMM
    Tarrant, RN
    McKenzie, DR
    Lim, SHN
    McCulloch, DG
    ISDEIV: XXTH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, 2002, 20 : 95 - 102
  • [29] Structure of MoCN films deposited by cathodic arc evaporation
    Gilewicz, A.
    Jedrzejewski, R.
    Kochmanska, A. E.
    Warcholinski, B.
    THIN SOLID FILMS, 2015, 577 : 94 - 96
  • [30] Control of stress and microstructure in cathodic arc deposited films
    Bilek, MMM
    Tarrant, RN
    McKenzie, DR
    Lim, SHN
    McCulloch, DG
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2003, 31 (05) : 939 - 944