Photochemical Stability and Photostabilizing Efficiency of Poly(methyl methacrylate) Based on 2-(6-Methoxynaphthalen-2-yl)propanoate Metal Ion Complexes

被引：33
|
作者：
Yousif, Emad [1 ]
El-Hiti, Gamal A. [2 ]
Haddad, Raghad [1 ]
Balakit, Asim A. [3 ]
机构：
[1] Al Nahrain Univ, Coll Sci, Dept Chem, Baghdad 64021, Iraq
[2] King Saud Univ, Coll Appl Med Sci, Dept Optometry, Cornea Res Chair, Riyadh 11433, Saudi Arabia
[3] Babylon Univ, Coll Pharm, Babylon, Iraq
来源：
POLYMERS | 2015年 / 7卷 / 06期
关键词：
photostabilizer; UV absorber; photochemistry; carboxylate; ultraviolet-visible spectroscopy; PMMA; SENSITIZED SOLAR-CELLS; LIGHT-EMITTING-DIODES; CROSS-LINKING; POLYSTYRENE; POLYMERS; PHOTODEGRADATION; POLYMERIZATION; PERFORMANCE; CONVENIENT; CATALYSTS;
D O I：
10.3390/polym7061005
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The photostabilization of poly(methyl methacrylate) (PMMA) films having 2-(6-methoxynaphthalen-2-yl)propanoate and Sn(II), Ni(II), Zn(II) and Cu(II) complexes was investigated. The production of PMMA films containing such complexes (0.5% by weight) was carried out by the casting method using chloroform. The photostabilization activities of the compounds were determined by monitoring the hydroxyl index with irradiation time. The quantum yield of the chain scission (phi(cs)) for the complexes in PMMA films and the changes in the viscosity average molecular weight of PMMA with irradiation time were evaluated. The rate of photostabilization for PMMA in the presence of the additives was found to follow the order NiL2 > CuL2 > ZnL2 > SnL2 (L, ligand). Depending on the structure of the additive, such as a peroxide decomposer, UV absorption or a radical scavenger for the photostabilizer, several mechanisms are suggested.
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页码：1005 / 1019
页数：15
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