Simultaneous measurement of optical inhomogeneity and thickness variation by using dual-wavelength phase-shifting photorefractive holographic interferometry

被引：7
|
作者：
Li, J. [1 ]
Wang, Y. R. [1 ]
Meng, X. F. [1 ]
Yang, X. L. [1 ]
Wang, Q. P. [1 ]
机构：
[1] Shandong Univ, Sch Informat Sci & Engn, Shandong Prov Key Lab Laser Technol & Applicat, Jinan 250100, Peoples R China
来源：
OPTICS AND LASER TECHNOLOGY | 2014年 / 56卷
基金：
中国国家自然科学基金;
关键词：
Thickness variation; Optical inhomogeneity; Dual-wavelength phase-shifting; interferometry; REFRACTIVE-INDEX; PARALLEL PLATES; HOMOGENEITY; WAFERS;
D O I：
10.1016/j.optlastec.2013.08.019
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A method to measure thickness variation and optical inhomogeneity simultaneously with a dual-wavelength phase-shifting photorefractive holographic interferometer is proposed. This method has no special requirements on the sample surfaces, and additional operations such as coating refractive index matching liquid on surfaces is not needed. With the help of photorefractive holographic interferometry, the wavefront distortion caused by the interferometer system is compensated automatically. Compared with other methods, this method is simpler and more accurate. Computer simulation and optical experiment have verified its feasibility and reliability. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码：241 / 246
页数：6
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