Electrical properties of (001)- and (116)-oriented epitaxial SrBi2Ta2O9 thin films prepared by metalorganic chemical vapor deposition

被引:93
|
作者
Ishikawa, K [1 ]
Funakubo, H [1 ]
机构
[1] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Innovat & Engn Mat, Midori Ku, Yokohama, Kanagawa 2268502, Japan
关键词
D O I
10.1063/1.124888
中图分类号
O59 [应用物理学];
学科分类号
摘要
(001)- and (116)-oriented epitaxial SrBi2Ta2O9 (SBT) thin films were deposited on (100)SrRuO(3)parallel to(100)SrTiO3 substrates at 750 degrees C and (110)SrRuO(3)parallel to(110)SrTiO3 substrates at 820 degrees C by metalorganic chemical vapor deposition, respectively. The remanent polarization and the coercive field of the 200-nm-thick (116)-oriented SBT films normal to the substrate were 11.4 mu C/cm(2) and 80 kV/cm, respectively. The dielectric constant of this film was 140 at 1 kHz. On the other hand, the 200-nm-thick (001)-oriented SrBi2Ta2O9 films normal to the substrate showed no ferroelectricity and the dielectric constant was 70 at 1 kHz. (C) 1999 American Institute of Physics. [S0003-6951(99)05339-5].
引用
收藏
页码:1970 / 1972
页数:3
相关论文
共 50 条
  • [42] Low-temperature preparation of SrBi2Ta2O9 thin films by electron cyclotron resonance plasma-enhanced metalorganic chemical vapor deposition and their electrical properties
    Nukaga, N
    Mitsuya, M
    Funakubo, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2000, 39 (9B): : 5496 - 5500
  • [43] Optimization of the growth of epitaxial SrBi2Ta2O9 thin films by pulsed laser deposition
    Lettieri, J
    Jia, Y
    Fulk, SJ
    Schlom, DG
    Hawley, ME
    Brown, GW
    THIN SOLID FILMS, 2000, 379 (1-2) : 64 - 71
  • [44] Preparation of SrBi2Ta2O9 thin films by liquid-delivery metalorganic chemical vapor deposition using a double alcoholate source
    Jimbo, Takehito
    Sano, Haruyuki
    Takahashi, Yuji
    Funakubo, Hiroshi
    Tokumitsu, Eisuke
    Ishiwara, Hiroshi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (11): : 6456 - 6461
  • [45] Growth and characterization of SrBi2Ta2O9 thin films by chemical solution deposition
    Chung, CW
    Kim, HI
    Byun, YH
    JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, 2002, 8 (03) : 253 - 256
  • [46] Characterization of SrBi2Ta2O9 ferroelectric thin films deposited at low temperatures by plasma-enhanced metalorganic chemical vapor deposition
    Seong, NJ
    Yoon, SG
    Lee, SS
    APPLIED PHYSICS LETTERS, 1997, 71 (01) : 81 - 83
  • [47] Preparation of SrBi2Ta2O9 thin films by liquid-delivery metalorganic chemical vapor deposition using a double alcoholate source
    Jimbo, T
    Sano, H
    Takahashi, Y
    Funakubo, H
    Tokumitsu, E
    Ishiwara, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (11): : 6456 - 6461
  • [48] Ferroelectric properties of SrBi2Ta2O9 thin films with Bi2O3 buffer layer by liquid-delivery metalorganic chemical vapor deposition
    Shin, WC
    Choi, KJ
    Yoon, SG
    THIN SOLID FILMS, 2002, 409 (01) : 133 - 137
  • [49] Oriented growth of SrBi2Ta2O9 ferroelectric thin films
    Desu, SB
    Vijay, DP
    Zhang, X
    He, BP
    APPLIED PHYSICS LETTERS, 1996, 69 (12) : 1719 - 1721
  • [50] Formation and properties of SrBi2Ta2O9 thin films
    Nagata, M.
    Vijay, D.P.
    Zhang, X.
    Desu, S.B.
    Physica Status Solidi (A) Applied Research, 1996, 157 (01): : 75 - 82