Some Studies on TiO2 Films Deposited by Sol-Gel Technique

被引:1
|
作者
Rao, K. Narasimha [1 ]
Vishwas, M. [2 ]
Sharma, Sudhir Kumar [1 ]
Gowda, K. V. Arjuna [2 ]
机构
[1] Indian Inst Sci, Dept Instrumentat, Opt Coating Lab, Bangalore 560012, Karnataka, India
[2] Govt Sci Coll, Dept Phys, Tumkur 572103, Karnataka, India
关键词
TiO2; sol-gel process; thin films; optical properties; XRD; SEM;
D O I
10.1117/12.799923
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
TiO2 films are extensively used in various applications including optical multi-layers, sensors, photo catalysis, environmental purification, and solar cells etc. These are prepared by both vacuum and non-vacuum methods. In this paper, we present the results on TiO2 thin films prepared by a sol-gel spin coating process in non-aqueous solvent. Titanium isopropoxide is used as TiO2 precursor. The films were annealed at different temperatures LIP to 300 degrees C for 5 hours in air. The influence of the various deposition parameters like spinning speed, spinning time and annealing temperature on the thickness of the TiO2 films has been studied. The variation of film thickness with time in ambient atmosphere was also studied. The optical, structural and morphological characteristics were investigated by optical transmittance-reflectance measurements, X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively. The refractive index and extinction coefficient of the films were determined by envelope technique and spectroscopic ellipsometry. TiO2 films exhibited high transparency (92%) in the visible region with a refractive index of 2.04 at 650 nm. The extinction coefficient was found to be negligibly small. The X-ray diffraction analysis showed that the TiO2 film deposited on glass substrate changes from amorphous to crystalline (anatase) phase with annealing temperature above 250 degrees C. SEM results show that the deposited films are uniform and crack free.
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页数:8
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