Effect of laser power on orientation and microstructure of TiO2 films prepared by laser chemical vapor deposition method

The TiO2 films were prepared on.Pt/Ti/SiO2/Si substrate by a laser chemical vapor deposition method. With increasing laser power (P-L) from 48 to 98 W, the deposition temperature (T-dep) monotonously increased from 849 to 929 K. At T-dep=849 K (P-L=48 W), the rutile TiO2 film was prepared with strong (110) and (200) peaks. With increasing T-dep from 849 to 883 K (P-L=71 W), the intensity of (110) peak increased. The (110)-oriented TiO2 films were obtained for T-dep beyond 903 K (P-L= 81 W). All TiO2 films showed faceted grains with the columnar cross-section. With increasing T-dep, the grain size increased and the column became wider. The high deposition rate '(R-dep) ranged from 13.04 to 24.84 mu m h(-1). (C) 2012 Elsevier B.V. All rights reserved.