Refractive index of the CuAlO2 delafossite

被引:17
|
作者
Pellicer-Porres, J. [1 ]
Segura, A. [1 ]
Kim, D. [2 ]
机构
[1] Univ Valencia, ICMUV, E-46100 Valencia, Spain
[2] Pukyong Natl Univ, Dept Chem, Pusan 608737, South Korea
关键词
ELECTRONIC-STRUCTURE; TRANSPARENT; FILMS; AL; CU; DEPOSITION; ALUMINUM;
D O I
10.1088/0268-1242/24/1/015002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The refractive index of the CuAlO2 delafossite has been determined from interference measurements in single crystals performed in the visible, near and mid infrared regions of the spectrum. The analysis of the refractive index dispersion corresponding to light polarization perpendicular to the c-axis (P perpendicular to c) yields a static dielectric constant of epsilon(0) = 7.7 +/- 0.8 and a low frequency electronic constant epsilon(infinity) = 5.1 +/- 0.1. The relevant infrared active E-u(up arrow) (TO) mode is found to be at 550 +/- 25 cm(-1). The electronic contribution can be well described by a Penn gap at 39 000 +/- 1000 cm(-1). Both the refractive index and its dispersion are found to be smaller for P parallel to c than for P perpendicular to c.
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页数:4
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