Formation of Polymer Films in Low-Temperature Ethylene Plasma

被引:2
|
作者
Lyakhovich, A. M. [1 ]
Lyalina, N. V. [1 ]
机构
[1] Russian Acad Sci, Dept Phys & Chem Nanomat, Inst Physicotech, Ural Div, Izhevsk 426000, Russia
关键词
Atomic Force Microscopy; Heptane; Polymer Film; Plasma Treatment; Surface Investigation;
D O I
10.1134/S1027451008030130
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Deposition of polymer films in low-temperature ethylene plasma, as in unsaturated hydrocarbons, proceeds in three stages. The formation of the film by means of cone-like macromolecular formations starts at lower temperatures but at higher internal stresses. Alternation of competition processes of deposition and destruction of the films manifests itself in healing of the cracks forming in the course of destruction.
引用
收藏
页码:399 / 402
页数:4
相关论文
共 50 条
  • [41] Low-temperature preparation of crystallized zirconia films by ECR plasma MOCVD
    Masumoto, Hiroshi
    Goto, Takashi
    SURFACE ENGINEERING FOR MANUFACTURING APPLICATIONS, 2006, 890 : 183 - +
  • [42] ECR PLASMA CVD OF INSULATOR FILMS - LOW-TEMPERATURE PROCESS FOR ULSI
    DOKI, M
    TAKASAKI, K
    FUJINO, K
    BAN, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (03) : C125 - C125
  • [43] LOW-TEMPERATURE PLASMA TREATMENT OF MONOMOLECULAR LANGMUIR-BLODGETT-FILMS
    KALACHEV, AA
    MATHAUER, K
    HOHNE, U
    MOHWALD, H
    WEGNER, G
    THIN SOLID FILMS, 1993, 228 (1-2) : 307 - 311
  • [44] LOW-TEMPERATURE DOUBLE-PLASMA PROCESS FOR BN FILMS ON SEMICONDUCTORS
    SCHMOLLA, W
    HARTNAGEL, HL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) : 2636 - 2637
  • [46] Low-temperature plasma etching of copper films using ultraviolet irradiation
    Choi, KS
    Han, CH
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (11): : 5945 - 5948
  • [47] LOW-TEMPERATURE SYNTHESIS OF DIAMOND FILMS USING MAGNETOMICROWAVE PLASMA CVD
    WEI, J
    KAWARADA, H
    SUZUKI, J
    HIRAKI, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (08): : L1483 - L1485
  • [48] Low-temperature plasma and fullerenes
    Dyuzhev, GA
    PLASMA DEVICES AND OPERATIONS, 2002, 10 (02): : 63 - 98
  • [49] CONDUCTIVITY OF LOW-TEMPERATURE PLASMA
    KALITKIN, NN
    HIGH TEMPERATURE, 1968, 6 (05) : 766 - &
  • [50] Encyclopedia of low-temperature plasma
    Fortov, V. E.
    HIGH TEMPERATURE, 2008, 46 (01) : 1 - 2