The nonlinear analysis of the metal-insulator semiconductor shows that the ac currents charging the interface traps lead to large dc operating voltage and an inefficient operation of the monolithic convolvers. These interface traps are annihilated during a low temperature anneal, which utilizes hydrogen atoms implanted underneath the SiO2-Si interface. The overlay piezoelectric ZnO film in the metal-ZnO-Si3N4-SiO2-Si structure is protected from the influx of hydrogen atoms by an interposed silicon nitride layer. Hydrogen implantation and rapid thermal annealing steps are integrated in the process sequence of realizing an efficient metal-ZnO-Si3N4-SiO2-Si monolithic surface acoustic wave convolver. (C) 2002 American Institute of Physics.
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Hanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Jang, Sang Hyun
Jin, Jun
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Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Jin, Jun
Kim, Kyoung Won
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Hanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Kyoung Won
Kim, Hyun Woo
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Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Kim, Hyun Woo
You, Joo Hyung
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Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
You, Joo Hyung
Lee, Keun Woo
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Hynix Semicond Inc, Div Res & Dev, Inchon 467701, Gyeonggi, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Lee, Keun Woo
Kim, Tae Whan
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Hanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea
Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South KoreaHanyang Univ, Dept Nanoscale Semicond Engn, Seoul 133791, South Korea