Silicon Crystal Pulling from the Melt of Si-45mass%Ni Alloy

被引:7
|
作者
Koyama, Takumi
Ikeda, Minoru [1 ]
Shibuta, Yasushi [1 ]
Suzuki, Toshio [1 ]
机构
[1] Univ Tokyo, Dept Mat Engn, Sch Engn, Tokyo 1138654, Japan
关键词
silicon; crystal pulling; silicon-nickel alloy; epitaxial growth; twins;
D O I
10.2355/tetsutohagane.94.496
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Silicon crystal pulling from the melt of Si-45mass%Ni alloy is performed as a model experiment of a silicon solidification refining process with silicon alloy melts. A needle-like silicon crystal is successfully grown, using, a seed crystal with a [211] crystallographic orientation to the pulling direction, which is poly-crystalline contains a large number of twins inside. A rod-type crystal with Si-Ni eutectics engulfed inside is also obtained. Appropriate ranges of melt superheating and pulling velocity for crystal growth are estimated to be front one to five degree Celsius and from 0.018 to 0.15 mm/min, respectively. It is necessary to decrease the Pulling velocity to less than 0.03 mm/min for obtaining the sufficient epitaxial growth on the seed crystal.
引用
收藏
页码:496 / 501
页数:6
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