Field-Induced Superconductivity in Electric Double Layer Transistors

被引:152
|
作者
Ueno, Kazunori [1 ,2 ]
Shimotani, Hidekazu [3 ]
Yuan, Hongtao [4 ]
Ye, Jianting [5 ,6 ,7 ]
Kawasaki, Masashi [5 ,6 ,7 ]
Iwasa, Yoshihiro [5 ,6 ,7 ]
机构
[1] Univ Tokyo, Dept Basic Sci, Bunkyo Ku, Tokyo 1158902, Japan
[2] Japan Sci & Technol Agcy, PRESTO, Chiyoda Ku, Tokyo 1020076, Japan
[3] Tohoku Univ, Dept Phys, Sendai, Miyagi 9808578, Japan
[4] Stanford Univ, Geballe Lab Adv Mat, Stanford, CA 94305 USA
[5] RIKEN, CEMS, Wako, Saitama 3510198, Japan
[6] Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, Tokyo 1138656, Japan
[7] Univ Tokyo, Dept Appl Phys, Bunkyo Ku, Tokyo 1138656, Japan
基金
日本科学技术振兴机构; 日本学术振兴会;
关键词
THIN-FILM TRANSISTORS; SINGLE-CRYSTAL TRANSISTORS; METAL-INSULATOR-TRANSITION; CARBON NANOTUBE; ROOM-TEMPERATURE; GATE INSULATOR; ELECTROCHEMICAL TRANSISTOR; TOPOLOGICAL INSULATOR; SEMICONDUCTING SRTIO3; YBA2CU3O7-DELTA FILMS;
D O I
10.7566/JPSJ.83.032001
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Electric field tuning of superconductivity has been a long-standing issue in solid state physics since the invention of the field-effect transistor (FET) in 1960. Owing to limited available carrier density in conventional FET devices, electric-field-induced superconductivity was believed to be possible in principle but impossible in practice. However, in the past several years, this limitation has been overcome by the introduction of an electrochemical concept, and electric-field-induced superconductivity has been realized. In the electric double layer (EDL) formed at the electrochemical interfaces, an extremely high electric field is generated and hence high-density charge carriers sufficient to induce superconductivity exist and are collectively used as a charge accumulation device known as an EDL capacitor. Field-induced superconductivity has been used to establish the relationship between T-c and carrier density and can now be used to search for new superconductors. Here, we review electric-field-induced superconductivity using an FET device, with a particular focus on the latest advances in EDL transistors.
引用
收藏
页数:16
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