Evaluation of Titanium Direct Bonding Mechanism

被引:5
|
作者
Baudin, F. [1 ]
Delaye, V. [1 ]
Guedj, C. [1 ]
Chevalier, N. [1 ]
Mariolle, D. [1 ]
Imbert, B. [1 ]
Fabbri, J. M. [1 ]
Di Cioccio, L. [1 ]
Brechet, Y. [2 ]
机构
[1] CEA, Leti, F-38054 Grenoble 9, France
[2] SIMaP, F-38402 St Martin Dheres, France
关键词
D O I
10.1149/2.015305jss
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Direct metal bonding represents an advanced joining technology that allows vertical stacking with electrical conduction and even heat dissipation. For most metals used as bonding layers, direct bonding when operating under ambient conditions involves metal oxides. The bonding interface saddles with a trapped oxide layer that might affect electrical conduction and even complete sealing of bonding interface. Titanium especially because of its high affinity with oxygen makes oxide free direct bonding very difficult. In the mean time, the remarkable getter effect of Ti matrix allows the dissolution of oxygen during post bonding annealing. In this paper, the bonding limits with regards to the titanium thickness have been investigated. The key role of layer roughness on the bonding quality and energy has been pointed out. A titanium thickness below 10 nm appears as a limit for an oxide free bonding in our conditions. (C) 2013 The Electrochemical Society.
引用
收藏
页码:N115 / N119
页数:5
相关论文
共 50 条
  • [31] EVALUATION OF 3 DIRECT BONDING ADHESIVES UTILIZING METAL BRACKETS
    SVITZER, JR
    MOON, PC
    JOURNAL OF DENTAL RESEARCH, 1976, 55 : B97 - B97
  • [32] EVALUATION OF THE EFFICIENCY OF THE DEGREE OF EVACUATION IN PROTECTING TITANIUM AGAINST OXIDIZATION IN DIFFUSION BONDING
    PESHKOV, VV
    WELDING PRODUCTION, 1983, 30 (11): : 37 - 39
  • [33] Atomistic simulations of effects of nanostructure on bonding mechanism and mechanical response of direct bonding of (111)-oriented nanotwinned Cu
    Wu, Cheng-Da
    Liao, Chien-Fu
    JOURNAL OF APPLIED PHYSICS, 2024, 136 (05)
  • [34] Mechanism of indium tin oxide//indium tin oxide direct wafer bonding
    Hoenle, Michael
    Oberhumer, Peter
    Hingerl, Kurt
    Wagner, Thorsten
    Huppmann, Sophia
    Katz, Simeon
    THIN SOLID FILMS, 2020, 704
  • [35] Plasma Treatment Mechanism in Si-SiO2 Direct Wafer Bonding
    Lee, Youngseok
    You, Yebin
    Cho, Chulhee
    Kim, Sijun
    Lee, Jangjae
    Kim, Minyoung
    Lee, Hanglim
    You, ShinJae
    SCIENCE OF ADVANCED MATERIALS, 2022, 14 (07) : 1265 - 1270
  • [36] Mechanism involved in direct hydrophobic Si(100)-2×1:H bonding
    C. Rauer
    H. Moriceau
    F. Rieutord
    J. M. Hartmann
    F. Fournel
    A. M. Charvet
    N. Bernier
    N. Rochat
    H. Dansas
    D. Mariolle
    C. Morales
    Microsystem Technologies, 2015, 21 : 961 - 968
  • [37] C-O bond enhancing direct bonding strength between plastic and pure titanium
    Kondoh, Katsuyoshi
    Umeda, Junko
    MATERIALS LETTERS, 2018, 211 : 331 - 334
  • [38] CLINICAL AND LABORATORY EVALUATION OF SOME ORTHODONTIC DIRECT BONDING-SYSTEMS
    BEECH, DR
    JALALY, T
    JOURNAL OF DENTAL RESEARCH, 1981, 60 (06) : 972 - 978
  • [39] The mechanism of bonding
    Campbell W.B.
    Tappi Journal, 2022, 21 (09): : 507 - 509
  • [40] BONDING OF TITANIUM-ALLOYS
    ALLEN, KW
    ALSALIM, HS
    WAKE, WC
    JOURNAL OF ADHESION, 1974, 6 (1-2): : 153 - 164