Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source

被引：2

作者：

Yabu, Takayuki ^{[1
]}

Kawasuji, Yasufumi ^{[1
]}

Hori, Tsukasa ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Tanaka, Hiroshi ^{[1
]}

Miyao, Kenichi ^{[1
]}

Ishii, Takuya ^{[1
]}

Watanabe, Yukio ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Abe, Tamotsu ^{[1
]}

Kodama, Takeshi ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Yamazaki, Taku ^{[1
]}

Itou, Noritoshi ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 | 2017年 / 10450卷

关键词：

EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; CO2-LASER;

D O I：

10.1117/12.2280503

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Gigaphoton Inc. is developing a CO2-Sn-LPP EUV light source based on unique and original technologies including a high power CO(2)laser with 15 nanosecond pulse duration, a solid-state pre-pulse laser with 10 picosecond pulse duration, a highly stabilized droplet generator, a precise laser-droplet shooting control system and a debris mitigation system using a magnetic field. In this paper, an update of the development progress of our 250W CO2-Sn-LPP EUV light source and of the key components is presented.

引用

页数：12

共 34 条

[31] NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W
Fomenkov, Igor V.
Purvis, Michael A.
Schafgans, Alexander A.
Tao, Yezheng
Rokitski, Slava
Stewart, Jayson
LaForge, Andrew
Ershov, Alexander I.
Rafac, Robert J.
De Dea, Silvia
Rajyaguru, Chirag
Vaschenko, Georgiy O.
Abraham, Mathew
Brandt, David C.
Brown, Daniel J.
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2018, 2018, 10809
[32] High average power CO2 laser MOPA system for Tin target LPP EUV light source
Ariga, Tatsuya
Hoshino, Hideo
Endo, Akira
HIGH ENERGY /AVERAGE POWER LASERS AND INTENSE BEAM APPLICATIONS, 2007, 6454
[33] High power and short pulse RF-excited CO2 laser MOPA system for LPP EUV light source
Ariga, T
Hoshino, H
Miura, T
Endo, A
LASER BEAM CONTROL AND APPLICATIONS, 2006, 6101
[34] High power EUV light source architecture based on 100 kHz CO2 laser driven Xe microdroplet plasma for 115W output at intermediate focus
Ariga, T., (Institute of Electrical and Electronics Engineers Inc., 445 Hoes Lane / P.O. Box 1331, Piscataway, NJ 08855-1331, United States):

← 1 2 3 4 →