This review covers recent advances in developing square arrays in thin films using block copolymers. Theoretical and experimental results from self-assembly of block copolymers in bulk and thin films, directed self-assembly of block copolymers confined in small wells, on substrates with arrays of posts, and on chemically nanopatterned substrates, as well as applications as nanolithography are reviewed. Some future work and hypothesis are discussed. (C) 2012 Wiley Periodicals, Inc. J Polym Sci Part B: Polym Phys, 2013
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Wan, Lei
Ruiz, Ricardo
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Ruiz, Ricardo
Gao, He
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Gao, He
Albrecht, Thomas R.
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Mol Vista Inc, 6840 Via Oro,Suite 110, San Jose, CA 95119 USAHGST, San Jose Res Ctr, 5601 Great Oaks Pkwy, San Jose, CA 95119 USA