Automated Heuristic Defect Classification (AHDC) for Haze Induced Defect Growth Management and Mask Requalification

被引:0
|
作者
Munir, Saghir [1 ]
Qidwai, Gul [1 ]
机构
[1] Reticle Labs, Palo Alto, CA USA
来源
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2 | 2012年 / 8324卷
关键词
ADC; classification; mask inspection; mask repair; defect management; defect tracking; haze; SYSTEM; SIMULATION; DIVAS;
D O I
10.1117/12.924329
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This article presents results from a heuristic automated defect classification algorithm for reticle inspection that mimics the classification rules. AHDC does not require CAD data, thus it can be rapidly deployed in a high volume production environment without the need for extensive design data management. To ensure classification consistency a software framework tracks every defect in repeated inspections. Through its various image based derived metrics it is shown that such a system manages and tracks repeated defects in applications such as haze induced defect growth.
引用
收藏
页数:10
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