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- [7] Defect Management of EUV mask PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XIX, 2012, 8441
- [9] DIVAS: An integrated networked system for mask defect dispositioning and defect management COST AND PERFORMANCE IN INTEGRATED CIRCUIT CREATION, 2003, 5043 : 114 - 122
- [10] An automated mask defect analysis system for increasing mask shop productivity Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2, 2005, 5853 : 353 - 360