Control of the ion flux and ion energy in CCP discharges using non-sinusoidal voltage waveforms

Using particle-in-cell simulations we perform a characterization of the ion flux and ion energy in a capacitively coupled rf plasma reactor excited with non-sinusoidal voltage waveforms. The waveforms used are positive Gaussian type pulses (with a repetition frequency of 13.56 MHz), and as the pulse width is decreased, three main effects are identified that are not present in typical symmetric sinusoidal discharges: (1) the ion flux (and plasma density) rapidly increases, (2) as the pressure increases a significant asymmetry in the ion fluxes to the powered and grounded electrodes develops and (3) the average ion energy on the grounded electrode cannot be made arbitrarily small, but in fact remains essentially constant (together with the bias voltage) for the pressures investigated (20-500mTorr). Effects (1) and (3) potentially offer a new form of control in these types of rf discharges, where the ion flux can be increased while keeping the average ion energy on the grounded electrode constant. This is in contrast with the opposite control mechanism recently identified in Donko et al (2009 J. Phys. D: Appl. Phys. 42 025205), where by changing the phase angle between applied voltage harmonics the ion flux can be kept constant while the ion energy (and bias voltage) varies.