MBE growth of cubic AlN films on MgO substrate via cubic GaN buffer layer

被引:8
|
作者
Kakuda, Masahiro [1 ]
Makino, Kenzo [1 ]
Ishida, Takashi [1 ]
Kuboya, Shigeyuki [1 ]
Onabe, Kentaro [1 ]
机构
[1] Univ Tokyo, Dept Adv Mat Sci, Kashiwa, Chiba 2778561, Japan
关键词
cubic nitride; MBE; AlN; XRD; MOLECULAR-BEAM EPITAXY; VAPOR-PHASE EPITAXY;
D O I
10.1002/pssc.201100395
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of a cubic GaN (c-GaN) buffer layer in the cubic AlN (c-AlN) growth on MgO substrate was investigated. Cubic AlN films were grown on MgO(001) substrates via a c-GaN buffer layer by RF-MBE. The c-AlN growth was confirmed by RHEED and XRD reciprocal space mapping analysis. On the other hand, no cubic AlN was grown without the c-GaN buffer. Therefore the cGaN buffer is necessary for the growth of c-AlN on MgO. It is considered that the lesser lattice-mismatch between c-AlN and c-GaN than c-AlN and MgO suppresses the hexagonal-phase inclusion. Only 0.5-nm-thick c-GaN buffer layer is enough for the c-AlN growth although the thin buffer layer causes rough surfaces of the c-AlN films. The effect of the c-AlN film growth condition on the c-AlN structural properties was also investigated. The growth temperature of 700 C and an Al-rich growing surface are required for the growth of smooth-surface c-AlN films. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:558 / 561
页数:4
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